Experience the advance generation of
contamination control method

Calibration Wafer Standard

A Calibration Wafer Standard is a NIST traceable, PSL wafer standard with Size Certificate included, deposited with monodisperse polystyrene latex beads and narrow size peak between 50nm and 10 microns to calibrate the size response curves of Tencor Surfscan 6220 and 6440, KLA-Tencor Surfscan SP1, SP2 and SP3 wafer inspection systems. A Calibration Wafer Standard is deposited as a FULL Deposition with a single particle size across the wafer; or deposited as a SPOT Deposition with 1 or more particle size standard peaks, precisely located around the wafer standard. These PSL contamination wafer standards are used by Semiconductor Metrology Managers to calibrate the size response curves of Scanning Surface Inspection Systems (SSIS) manufactured by KLA-Tencor, Topcon, ADE and Hitachi.  PSL Wafer Standards are also used to evaluate how uniform a Tencor Surfscan tool scans across the silicon or film deposited wafer. 

A Calibration Wafer Standard is used to verify and control two specifications of an SSIS tool: size accuracy at specific particle sizes and uniformity of scan across the wafer during each scan. The Calibration wafer is most often provided as a full deposition at one particle size, typically between 50nm and 12 microns. By depositing across the wafer, i.e, a full deposition, the wafer inspection system keys in on the particle peak, and the operator can easily determine if the SSIS tool is in specification at this size.

PSL Wafer Standards come in two types of depositions: Full Deposition and Spot Deposition shown.
Either Polystyrene Latex Spheres (PSL Spheres) or Silica nanoparticles can be deposited.
PSL Wafer Standards with a Spot Deposition are used for size accuracy calibration of the SSIS. 









Share Product

Enquiry Form
Website Form