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Contamination Wafer Standard

A Contamination Wafer Standard is a NIST traceable, particle wafer standard with Size Certificate included, deposited with monodisperse silica nano-particles and narrow size peak between 50nm and 2 microns to calibrate the size response curves of KLA-Tencor Surfscan SP3, SP5 SP5xp wafer inspection systems and Hitachi SEM and TEM systems. This Silica Wafer Standard is deposited as a FULL Deposition with a single particle size across the wafer; or deposited as a SPOT Deposition with 1 or more particle size standards precisely located around the wafer.

A Contamination Wafer Standard can be deposited as a full deposition or spot deposition on a prime silicon wafer with a narrow size peak of particle size standards. 50 nanometer to 2um particle wafer standards can be provided with 1 or more spot depositions around the wafer with a controlled particle count between 1000 and 2500 per size deposited. Full Deposition across the wafer is also provided with particle counts ranging from 5000 to 10000 particles across the wafer.  A Contamination Wafer Standard is deposited with silica nanoparticles to calibrate the size response curves of wafer inspection systems using high powered, scanning lasers, such as KLA-Tencor SP5 and SPx. Contamination Wafer Standards deposited at 100 nano-meters diameter and above are scanned by a KLA-Tencor Surfscan SP1. Wafer standards below 100nm particle diameter are scanned by a KLA-Tencor Surfscan SP5 and SP5xp.

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